Ti, TiN, and TiCrN films have been deposited by magnetron sputtering on 316L stainless steel substrates to improve their surface properties. Electrochemical performances and adhesions of these deposits in a simulated physiological solution (SBF) were studied and compared. As a result, the TiCrN deposition has the lowest corrosion resistance in the SBF solution because of the presence of a high density of porosity in its structure. The TiN deposit has shown good resistance to corrosion, but its critical load (Lc3-TiN), corresponding to its removal from the substrate is relatively low and has a risk of delamination, which can limit its use. However, the Ti deposit has a high resistance to corrosion (i_corr(Ti) = 0.57.10^-6 A.cm^-2 and R_p(Ti) = 67.98 KW.cm²). These parameters provide testimony to its strong passivation. The critical load (Lc3-Ti), the crack propagation resistance (CPRs-Ti) and the scratch hardness (HS_L-Ti) also testify to its high adhesion to the 316L substrate. Thus, the Ti deposit has proved to be the most favorable protective coating for 316L stainless steel in an SBF solution.