In the present paper, we have studied the effect of the thickness on the structural, surface morphology and electrical properties of Permalloy (Py) thin films Ni₈₀Fe₂₀ (Py). For then, a series of Py thin films samples were successfully evaporated on Si (100) substrates. Thereafter, we have opted for few characterizations in order to refine our study. In this context, we found that the growth interval of the thickness lies between 110 nm and 505 nm. XRD spectra analysis reveal that our samples were polycrystalline and principally growth within <111> and <200> textures. Lattice parameters for Py/Si (100) samples were found to be very close to that of bulk NiFe "Py"(a_bulk= 3.5385) As thickness of our samples increase from 110 to 505 nm, we found that grain size obtained from Scherrer formula expend in an abrupt manner from about 56 Ȧ to 134 Ȧ. Visualization of our samples surface was carrying out using an atomic Force Microscopy "AFM". Our samples behave relatively smooth with little surface roughness. Consequently, the RMS factor values were a somewhat weak that change in the range from 1.324nm to 0.201nm. A good relationship was established between RMS factors, thicknesses and resistivity values. This last have reached their highest value of about 94.33μΩ.cm when thickness enlarges to about 505í…. As thickness rise, Py samples become little more resistive and rough. Indeed, this is was our ambition to refining this work and get more discussions about the influence of thickness evolution on surface morphology and electrical properties of Ni₈₀Fe₂₀ Py samples.

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