Indium oxide nanostructured thin films are successfully deposited by ultrasonic spray technique on glass substrates at 400^â—¦C. Air Pressure influence on the properties of these films is then studied using several techniques, as well as XRD, SEM UV–visible and four-point probe. The XRD analysis shows that the films are polycrystalline with body-centered cubic structure, and the preferred growth orientation change from the (222) to (400) plane with the increase of the air pressure. We attribute this change to the energy increasing of the arriving particles to the surface substrate. Surface morphology of the films changes with increasing of air Pressure. The optical transmittance of these films improves with increasing of air pressure. This improvement is related to the decrease of the films thickness and/or improvement in the crystalline state of the films. The optical band gap is found to decrease from 3.90 to 3.78 ev. The electrical resistivity decreases from 75 Ω cm to 12.3 10^-3 Ω cm.